Tools and Environments for Parallel and Distributed Systems edited by Amr Zaky, Ted Lewis.

Developing correct and efficient software is far more complex for parallel and distributed systems than it is for sequential processors. Some of the reasons for this added complexity are: the lack of a universally acceptable parallel and distributed programming paradigm, the criticality of achieving...

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Bibliographic Details
Corporate Author: SpringerLink (Online service)
Other Authors: Zaky, Amr (Editor), Lewis, Ted (Editor)
Format: eBook
Language:English
Published: New York, NY : Springer US : Imprint: Springer, 1996.
Edition:1st ed. 1996.
Series:International Series in Software Engineering, 2
Springer eBook Collection.
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Online Access:Click to view e-book
Holy Cross Note:Loaded electronically.
Electronic access restricted to members of the Holy Cross Community.
Description
Summary:Developing correct and efficient software is far more complex for parallel and distributed systems than it is for sequential processors. Some of the reasons for this added complexity are: the lack of a universally acceptable parallel and distributed programming paradigm, the criticality of achieving high performance, and the difficulty of writing correct parallel and distributed programs. These factors collectively influence the current status of parallel and distributed software development tools efforts. Tools and Environments for Parallel and Distributed Systems addresses the above issues by describing working tools and environments, and gives a solid overview of some of the fundamental research being done worldwide. Topics covered in this collection are: mainstream program development tools, performance prediction tools and studies; debugging tools and research; and nontraditional tools. Audience: Suitable as a secondary text for graduate level courses in software engineering and parallel and distributed systems, and as a reference for researchers and practitioners in industry.
Physical Description:XI, 305 p. online resource.
ISBN:9781461541233
ISSN:1384-6469 ;
DOI:10.1007/978-1-4615-4123-3