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121227s1989 xxu| s |||| 0|eng d |
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|a 9781461307938
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|a 10.1007/978-1-4613-0793-8
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|a (DE-He213)978-1-4613-0793-8
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|a Particles in Gases and Liquids 1
|h [electronic resource] :
|b Detection, Characterization, and Control /
|c edited by K.L. Mittal.
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|a Proceedings of a symposium held in conjunction with the 18th Annual Meeting of the Fine Particle Society held in Boston, Massachusetts, August 3-7, 1987
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| 250 |
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|a 1st ed. 1989.
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| 264 |
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|a New York, NY :
|b Springer US :
|b Imprint: Springer,
|c 1989.
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| 300 |
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|a 312 p.
|b online resource.
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|a text
|b txt
|2 rdacontent
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|a computer
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|a Springer eBook Collection
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|a Monitoring Contaminant Particles in Gases and Liquids: A Review -- Measuring and Identifying Particles in Ultrapure Water -- Non-Poisson Models of Particle Counting -- Liquid Particle Counter Comparison -- Particle Counting of Liquid Systems using a Scanning Electron Microscope -- Improved Methodology for Measurement of Particle Concentrations in Semiconductor Process Chemicals -- Calibration of the Photo-sedimentometer LUMOSED with a Powder of Known Particle Size Distribution -- Particle Contamination Control and Measurement in Ultra-pure VLSI Grade Inert Gases -- Design and Practical Considerations in Using Cascade Impactors to Collect Particle Samples from Process Gases for Identification -- In-situ Monitoring of Particulate Contamination in Integrated Circuit Process Equipment -- A Real-time Fallout Monitor for 5–250 Micrometer Particles -- Measurement and Control of Particle-Bearing Air Currents in a Vertical Laminar Flow Clean Room -- Particle Deposition Velocity Studies in Silicon Technology -- Influence of Particle Charge on the Collection Efficiency of Electrified Filter Mats -- Particle Retention and Downstream Cleanliness of Point-of-use Filters for Semiconductor Process Gases -- A Fluid Dynamic Study of a Microcontaminant Particles Removal Process -- Particle Removal from Semiconductor Wafers using Cleaning Solvents -- Particle Contributions of Three Types of Cleanroom Jumpsuits -- Particle Generation in Devices used in Clean Manufacturing -- About the Contributors.
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| 520 |
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|a This book documents the proceedings of the Symposium on Particles in Fluids: Detection, Characterization and Control held as a part of the 18th Fine Particle Society meeting in Boston, August 3-7, 1987. This was the Premier symposium on this topic and the response was so good that we have decided to organize it on a biennial basis and the second symposium will be held under the rubric Particles in Gases and Liquids: Detection, Characterization and Control at the 20th Fine Particle Society meeting in Boston, August 22-26, 1989. In the modern manufacture of sophisticated and sensitive microelectronic components and other precision parts, there has been a great deal of concern about yield losses due to micrometer- and submicrometer-sized particles. These particles can originate from a number of sources including fluids, i. e. , gases and liquids used in the manufacturing process. So the detection, characterization and control or removal of these undesirable particles is of cardinal importance and this symposium was conceived and õganized with this in mind. The purposes of this symposium were to bring together those actively involved in all aspects of particles in fluids, to provide a forum for discussion of the latest techniques for the detection, characterization and control of particles, and to highlight areas which needed intensified R&D efforts. The printed program contained a total of 46 papers and a variety of topics dealing with various ramifications of particles in fluids were presented.
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| 590 |
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|a Loaded electronically.
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| 590 |
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|a Electronic access restricted to members of the Holy Cross Community.
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| 650 |
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|a Physical chemistry.
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| 690 |
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|a Electronic resources (E-books)
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| 700 |
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|a Mittal, K.L.
|e editor.
|4 edt
|4 http://id.loc.gov/vocabulary/relators/edt
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| 710 |
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|a SpringerLink (Online service)
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