Theory and Application of Laser Chemical Vapor Deposition

Theory and Application of Laser Chemical Vapor Deposition by J. Mazumder, Aravinda Kar.

In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemi...

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Bibliographic Details
Main Authors: Mazumder, J. (Author), Kar, Aravinda (Author)
Corporate Author: SpringerLink (Online service)
Format: eBook
Language:English
Published: New York, NY : Springer US : Imprint: Springer, 1995.
Edition:1st ed. 1995.
Series:Lasers, Photonics, and Electro-Optics
Springer eBook Collection.
Subjects:
Electrical engineering.
Optical materials.
Electronic materials.
Electronic resources (E-books)
Online Access:Click to view e-book
Holy Cross Note:Loaded electronically.
Electronic access restricted to members of the Holy Cross Community.
Description
Summary:In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemical kinetics, and adsorption. With this reference, researchers will discover how to apply these principles to developing theories about various types of LCVD processes; gain greater insight into the basic mechanisms of LCVD; and obtain the ability to design and control an LCVD system.
Physical Description:XII, 396 p. online resource.
ISBN:9781489914309
DOI:10.1007/978-1-4899-1430-9

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