Ion acceleration and extreme light field generation based on ultra-short and ultra–intense lasers by Liangliang Ji.

This book is dedicated to the relativistic (laser intensity above 1018 W/cm2) laser-plasma interactions, which mainly concerns two important aspects: ion acceleration and extreme-light-field (ELF). Based on the ultra-intense and ultra-short CP lasers, this book proposes a new method that significant...

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Bibliographic Details
Main Author: Ji, Liangliang (Author)
Corporate Author: SpringerLink (Online service)
Format: eBook
Language:English
Published: Berlin, Heidelberg : Springer Berlin Heidelberg : Imprint: Springer, 2014.
Edition:1st ed. 2014.
Series:Springer Theses, Recognizing Outstanding Ph.D. Research,
Springer eBook Collection.
Subjects:
Online Access:Click to view e-book
Holy Cross Note:Loaded electronically.
Electronic access restricted to members of the Holy Cross Community.

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505 0 |a Introduction -- Ion acceleration I: Efficient heavy ion acceleration by ESA.- Ion acceleration II: The critical target thickness in light sail acceleration -- Extreme light field generation I: Quasi-single-cycle relativistic laser pulse -- Extreme light field generation II: Short-wavelength single-cycle ultra-intense laser pulse -- Extreme light field generation III: Ultra-intense isolated attosecond pulse -- Summary. 
520 |a This book is dedicated to the relativistic (laser intensity above 1018 W/cm2) laser-plasma interactions, which mainly concerns two important aspects: ion acceleration and extreme-light-field (ELF). Based on the ultra-intense and ultra-short CP lasers, this book proposes a new method that significantly improves the efficiency of heavy-ion acceleration, and deals with the critical thickness issues of light pressure acceleration. More importantly, a series of plasma approaches for producing ELFs, such as the relativistic single-cycle laser pulse, the intense broad-spectrum chirped laser pulse and the ultra-intense isolated attosecond (10-18s) pulse are introduced. This book illustrates that plasma not only affords a tremendous accelerating gradient for ion acceleration but also serves as a novel medium for ELF generation, and hence has the potential of plasma-based optics, which have a great advantage on the light intensity due to the absence of device damage threshold. 
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