Physical Design and Mask Synthesis for Directed Self-Assembly Lithography

Physical Design and Mask Synthesis for Directed Self-Assembly Lithography by Seongbo Shim, Youngsoo Shin.

This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-asse...

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Bibliographic Details
Main Authors: Shim, Seongbo (Author), Shin, Youngsoo (Author)
Corporate Author: SpringerLink (Online service)
Format: eBook
Language:English
Published: Cham : Springer International Publishing : Imprint: Springer, 2018.
Edition:1st ed. 2018.
Series:NanoScience and Technology,
Springer eBook Collection.
Subjects:
Nanotechnology.
Electronic circuits.
Optical materials.
Electronic materials.
Nanoscale science.
Nanoscience.
Nanostructures.
Semiconductors.
Electronic resources (E-books)
Online Access:Click to view e-book
Holy Cross Note:Loaded electronically.
Electronic access restricted to members of the Holy Cross Community.
Description
Summary:This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.
Physical Description:XIV, 138 p. 92 illus., 54 illus. in color. online resource.
ISBN:9783319762944
ISSN:1434-4904
DOI:10.1007/978-3-319-76294-4

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