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ocn923260597 |
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20241006213017.0 |
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151010s1900 dcu o 000 0 eng d |
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|a EBLCP
|b eng
|e pn
|c EBLCP
|d OCLCQ
|d MERUC
|d OCLCQ
|d ZCU
|d ICG
|d OCLCO
|d OCLCF
|d OCLCQ
|d OCLCO
|d OCLCQ
|d DKC
|d AU@
|d OCLCQ
|d OCLCO
|d OCLCQ
|d OCLCO
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|a 9780309583954
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|a 0309583950
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|a (OCoLC)923260597
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|a T
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|a HCDD
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|a Staff, National Research Council.
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|a Beam Technologies for Integrated Processing.
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|a Washington :
|b National Academies Press,
|c 1900.
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300 |
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|a 1 online resource (106 pages)
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336 |
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|a text
|b txt
|2 rdacontent
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|a computer
|b c
|2 rdamedia
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|a online resource
|b cr
|2 rdacarrier
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|a Print version record.
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|a ""BEAM TECHNOLOGIES FOR INTEGRATED PROCESSING""; ""Copyright""; ""ABSTRACT""; ""PREFACE""; ""ACKNOWLEDGMENTS""; ""Contents""; ""1 Introduction ""; ""2 SUMMARY AND RECOMMENDATIONS ""; ""SUMMARY""; ""Electronic Materials""; ""Engineered Materials""; ""Integrated Processing""; ""RECOMMENDATIONS""; ""3 BEAM TECHNOLOGIES ""; ""ATOMIC AND MOLECULAR MATERIAL BEAMS""; ""Physical Vapor Deposition""; ""Direct Evaporation Processes""; ""Direct Reactive Evaporation Processes""; ""Direct Sputtering Processes""; ""Reactive Sputtering Processes""; ""Ion Beam Sputtering Processes""
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|a ""Molecular Beam Epitaxy""""Chemical Vapor Deposition Processes""; ""Microwave Electron Cyclotron Resonance Plasmas""; ""Ion Beams""; ""Energy Beams""; ""Laser Beams""; ""Electron Beams""; ""X-Ray Lithography""; ""Microwave Beams""; ""REFERENCES""; ""4 BEAM APPLICATIONS IN MICROELECTRONICS ""; ""BEAM APPLICATIONS IN SEMICONDUCTOR DEVICE MANUFACTURE""; ""Silicon Integrated Circuits""; ""Beam Technologies For Materials Deposition""; ""Beam Technologies For Patterning""; ""Beam Technologies For Etching""; ""BEAM TECHNOLOGIES FOR COMPOUND SEMICONDUCTOR ICS""
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|a ""Beam Technologies For Materials Deposition""""Beam Technologies For Heating""; ""OPTOELECTRONICS""; ""REFERENCES""; ""5 BEAM APPLICATIONS IN ENGINEERED MATERIALS""; ""COATINGS""; ""Diamond, Diamond-Like Carbon, And Cubic Boron Nitride Coatings""; ""SURFACE MODIFICATION""; ""APPLICATIONS OF LASERS TO MATERIALS FORMING""; ""Shaping And Removal""; ""Desktop Deposition""; ""Joining""; ""POWDER PREPARATION""; ""COMPOSITES FABRICATION""; ""Fiber And Whisker Preparation""; ""Metal-Matrix Composites Fabrication""; ""Ceramic-Matrix Composites Fabrication""; ""NANOPHASE MATERIALS""
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|a ""OPTICAL SURFACES AND DEVICES""""POLYMERS""; ""MATERIALS FOR ENERGY PRODUCTION""; ""BIOIMPLANT DEVICES""; ""REFERENCES""; ""6 INTEGRATED PROCESSING ""; ""INTEGRATED PROCESSING IN MICROELECTRONICS""; ""Integrated Processing For Integrated Circuits""; ""Traditional Integrated Circuit Processing Techniques""; ""Advances Toward Integrated Processing""; ""Integrated Processing Tools""; ""Applications For Integrated Processing Tools""; ""INTEGRATED PROCESSING FOR METALS AND CERAMICS""; ""Architectural Glass Coatings""; ""In-Line Dry Coating Process For Stainless Steel Sheet""
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|a ""Mechanical Fabrication""""REFERENCES""; ""7 REQUIREMENTS AND PROBLEMS FOR FURTHER INTEGRATION ""; ""REFERENCE""; ""APPENDIX A ACRONYMS AND ABBREVIATIONS""; ""APPENDIX B BIOGRAPHICAL SKETCHES OF COMMITTEE MEMBERS ""
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|a Microelectronics industry.
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|a Molecular beams
|x Industrial applications.
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|a Microelectronics
|x Materials.
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|a Plasma-enhanced chemical vapor deposition
|x Industrial applications.
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7 |
|a Microelectronics industry
|2 fast
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7 |
|a Microelectronics
|x Materials
|2 fast
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650 |
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|a Molecular beams
|x Industrial applications
|2 fast
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|a Plasma-enhanced chemical vapor deposition
|x Industrial applications
|2 fast
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0 |
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|i Print version:
|a Staff, National Research Council.
|t Beam Technologies for Integrated Processing.
|d Washington : National Academies Press, ©1900
|z 9780309046350
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856 |
4 |
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|u https://ebookcentral.proquest.com/lib/holycrosscollege-ebooks/detail.action?docID=3376029
|y Click for online access
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|a EBC-AC
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|a 92
|b HCD
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