MARC

LEADER 00000cam a2200000Mu 4500
001 ocn923265516
003 OCoLC
005 20240504213016.0
006 m o d
007 cr |n|||||||||
008 151010s1996 dcu o 000 0 eng d
040 |a EBLCP  |b eng  |e pn  |c EBLCP  |d OCLCQ  |d MERUC  |d OCLCQ  |d XFH  |d OCLCQ  |d OCLCO  |d ZCU  |d AGLDB  |d OCLCF  |d OCLCQ  |d ICG  |d OCLCQ  |d DKC  |d AU@  |d OCLCQ  |d UKAHL  |d OCLCQ  |d OCLCO  |d OCLCQ  |d OCLCO  |d OCLCQ 
019 |a 994354921 
020 |a 9780309573535 
020 |a 030957353X 
020 |a 0309055911 
020 |a 9780309055918 
035 |a (OCoLC)923265516  |z (OCoLC)994354921 
050 4 |a TK7871.85.D374 1996eb 
049 |a HCDD 
100 1 |a Staff, National Research Council. 
245 1 0 |a Database Needs for Modeling and Simulation of Plasma Processing. 
260 |a Washington :  |b National Academies Press,  |c 1996. 
300 |a 1 online resource (74 pages) 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
490 0 |a The compass series Database needs for modeling and simulation of plasma processing 
588 0 |a Print version record. 
505 0 |a Database Needs for Modeling and Simulation of Plasma Processing -- Copyright -- Preface -- Contents -- Executive Summary -- FINDINGS -- CONCLUSIONS -- RECOMMENDATIONS -- REFERENCES -- 1 Industrial Perspectives -- INTRODUCTION -- PLASMA PROCESSING FOR SEMICONDUCTOR MANUFACTURING -- PLASMA EQUIPMENT SUPPLIER PERSPECTIVES -- CHIP MANUFACTURER PERSPECTIVES -- RECOMMENDED PRIORITIES FOR DEVELOPMENT OF AN IMPROVED DATABASE -- FINDINGS -- CONCLUSIONS -- REFERENCES -- 2 Tool Scale and Feature Scale Models -- INTRODUCTION -- TOOL SCALE MODELS 
505 8 |a Capabilities Needed for Tool Scale ModelsBarriers to Using Tool Scale Models -- FEATURE SCALE MODELS -- GENERAL ASSESSMENT OF MODELING STATE OF THE ART AND VISION OF FUTURE CAPABILITY AND IMPLIED NEEDS -- FINDINGS -- CONCLUSIONS -- REFERENCES -- 3 Radiative Processes and Diagnostics -- INTRODUCTION -- TECHNIQUES FOR MEASUREMENTS OF GAS PHASE SPECIES -- Information Resources -- Roles of the Database In Motivating Diagnostic Experiments -- SURFACE REACTION DATABASE AND DIAGNOSTICS -- Information Resources -- New Diagnostic Techniques -- FINDINGS 
504 |a ""REFERENCES""""4 Heterogeneous Processes ""; ""INTRODUCTION""; ""STATE OF THE DATABASE""; ""TECHNIQUES FOR IMPROVING THE DATABASE""; ""Approach""; ""Measurements On Realistic Plasma Reactors""; ""Incident Flux and Desorbing Flux Analysis""; ""Condition of the Surface""; ""Technology""; ""Ultrahigh-Vacuum Approach Using Mass and Energy Selected Reactive Beams""; ""Particle Beams""; ""Sticking Coefficients""; ""Synergistic Effects""; ""Substrate Temperature Dependence""; ""Angle Dependence""; ""Computer Simulations""; ""FINDINGS""; ""REFERENCES""; ""5 Electron Collision Processes "" 
505 8 |a INTRODUCTIONIONIZATION -- Atoms -- Molecules -- Theoretical Methods and Advances -- Neutral Dissociation -- ELECTRON-IMPACT EXCITATION -- ATTACHMENT -- MOMENTUM TRANSFER, SWARM, AND DISCHARGE MEASUREMENTS -- GENERAL COMMENTS -- FINDINGS -- REFERENCES -- 6 Ion Processes, Neutral Chemistry, And Thermochemical Data -- INTRODUCTION -- CROSS SECTIONS AND RATE COEFFICIENTS -- Ion Processes -- Momentum Transfer -- Ion-Molecule and Charge Exchange Reactions -- Ion-Ion Neutralization -- Electron-Ion Recombination 
505 8 |a Ion-Neutral and Neutral-Neutral ExcitationNeutral Chemistry -- Status of the Database -- Excited State Chemistry and Penning Ionization -- Summary -- Ion Processes -- Neutral Chemistry -- THERMOCHEMICAL DATA -- FINDINGS -- REFERENCES -- Appendix A: Acronyms and Abbreviations -- Appendix B: Workshop Agenda -- Appendix C: Workshop Participants 
546 |a English. 
650 0 |a Semiconductors  |x Design and construction  |v Congresses. 
650 0 |a Plasma engineering  |x Databases  |v Congresses. 
650 0 |a Plasma engineering  |x Computer simulation  |v Congresses. 
650 7 |a Plasma engineering  |x Computer simulation  |2 fast 
650 7 |a Semiconductors  |x Design and construction  |2 fast 
655 7 |a Conference papers and proceedings  |2 fast 
776 0 8 |i Print version:  |a Staff, National Research Council.  |t Database Needs for Modeling and Simulation of Plasma Processing.  |d Washington : National Academies Press, ©1900  |z 9780309055918 
856 4 0 |u https://ebookcentral.proquest.com/lib/holycrosscollege-ebooks/detail.action?docID=3376683  |y Click for online access 
903 |a EBC-AC 
994 |a 92  |b HCD