Indholdsfortegnelse:
  • Database Needs for Modeling and Simulation of Plasma Processing
  • Copyright
  • Preface
  • Contents
  • Executive Summary
  • FINDINGS
  • CONCLUSIONS
  • RECOMMENDATIONS
  • REFERENCES
  • 1 Industrial Perspectives
  • INTRODUCTION
  • PLASMA PROCESSING FOR SEMICONDUCTOR MANUFACTURING
  • PLASMA EQUIPMENT SUPPLIER PERSPECTIVES
  • CHIP MANUFACTURER PERSPECTIVES
  • RECOMMENDED PRIORITIES FOR DEVELOPMENT OF AN IMPROVED DATABASE
  • FINDINGS
  • CONCLUSIONS
  • REFERENCES
  • 2 Tool Scale and Feature Scale Models
  • INTRODUCTION
  • TOOL SCALE MODELS
  • Capabilities Needed for Tool Scale ModelsBarriers to Using Tool Scale Models
  • FEATURE SCALE MODELS
  • GENERAL ASSESSMENT OF MODELING STATE OF THE ART AND VISION OF FUTURE CAPABILITY AND IMPLIED NEEDS
  • FINDINGS
  • CONCLUSIONS
  • REFERENCES
  • 3 Radiative Processes and Diagnostics
  • INTRODUCTION
  • TECHNIQUES FOR MEASUREMENTS OF GAS PHASE SPECIES
  • Information Resources
  • Roles of the Database In Motivating Diagnostic Experiments
  • SURFACE REACTION DATABASE AND DIAGNOSTICS
  • Information Resources
  • New Diagnostic Techniques
  • FINDINGS
  • INTRODUCTIONIONIZATION
  • Atoms
  • Molecules
  • Theoretical Methods and Advances
  • Neutral Dissociation
  • ELECTRON-IMPACT EXCITATION
  • ATTACHMENT
  • MOMENTUM TRANSFER, SWARM, AND DISCHARGE MEASUREMENTS
  • GENERAL COMMENTS
  • FINDINGS
  • REFERENCES
  • 6 Ion Processes, Neutral Chemistry, And Thermochemical Data
  • INTRODUCTION
  • CROSS SECTIONS AND RATE COEFFICIENTS
  • Ion Processes
  • Momentum Transfer
  • Ion-Molecule and Charge Exchange Reactions
  • Ion-Ion Neutralization
  • Electron-Ion Recombination
  • Ion-Neutral and Neutral-Neutral ExcitationNeutral Chemistry
  • Status of the Database
  • Excited State Chemistry and Penning Ionization
  • Summary
  • Ion Processes
  • Neutral Chemistry
  • THERMOCHEMICAL DATA
  • FINDINGS
  • REFERENCES
  • Appendix A: Acronyms and Abbreviations
  • Appendix B: Workshop Agenda
  • Appendix C: Workshop Participants