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|a HCDD
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|a Mittal, K. L.
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|a Particles on surfaces 8 :
|b Detection, adhesion and removal.
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|a Leiden :
|b BRILL,
|c 2003.
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|a 1 online resource (361 pages)
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|a text
|b txt
|2 rdacontent
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|a computer
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|a Print version record.
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|a Preface; Part 1: Particle Analysis / Characterization and General Cleaning-Related Topics; The nature and characterization of small particles; Surface and micro-analytical methods for particle identification; The haze of a wafer: A new approach to monitor nano-sized particles; Particle transport and adhesion in an ultra-clean ion-beam sputter deposition process; Particle deposition from a carry-over layer during immersion rinsing; The use of surfactants to reduce particulate contamination on surfaces; The use of rectangular jets for surface decontamination.
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|a Ice-air blast cleaning: Case studiesDevelopment of a technique for glass cleaning in the course of demanufacturing of electronic products; Part 2: Particle Adhesion and Removal; Mechanics of nanoparticle adhesion -- A continuum approach; A new thermodynamic theory of adhesion of particles on surfaces; Particle adhesion on nanoscale rough surfaces; Advanced wet cleaning of sub-micrometer sized particles; Modified SC-1 solutions for silicon wafer cleaning; Investigation of ozonated DI water in semiconductor wafer cleaning; Possible post-CMP cleaning processes for STI ceria slurries.
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|a The ideal ultrasonic parameters for delicate parts cleaningEffects of megasonics coupled with SC-1 process parameters on particle removal on 300-mm silicon wafers; Influences of various parameters on microparticles removal during laser surface cleaning; Particle removal with pulsed-laser induced plasma over an extended area of a silicon wafer; Particle removal by collisions with energetic clusters.
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|a This work documents the proceedings of the 8th International Symposium on Particles on Surfaces - Detection, Adhesion and Removal, held in Providence, Rhode Island, from June 24-26, 2002. Topics include nature and characterization of small particles, and particle deposition during immersion rinsing.
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|a Particles
|v Congresses.
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|a Surfaces (Technology)
|v Congresses.
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|a Particles
|2 fast
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|a Surfaces (Technology)
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|a Conference papers and proceedings
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|a Mittal, K. L.
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|i has work:
|a Particles on surfaces 8 (Text)
|1 https://id.oclc.org/worldcat/entity/E39PCG9Q8TPBtC6kcywXjYh9ym
|4 https://id.oclc.org/worldcat/ontology/hasWork
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|i Print version:
|a Mittal, K.L.
|t Particles on surfaces 8 : Detection, adhesion and removal.
|d Leiden : BRILL, ©2003
|z 9789067643924
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|u https://ebookcentral.proquest.com/lib/holycrosscollege-ebooks/detail.action?docID=253651
|y Click for online access
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|a EBC-AC
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