Skip to content
Library Home
Start Over
Research Databases
E-Journals
Course Reserves
Library Home
Login to library account
English
Deutsch
Español
Français
Italiano
日本語
Nederlands
Português
Português (Brasil)
中文(简体)
中文(繁體)
Türkçe
עברית
Gaeilge
Cymraeg
Ελληνικά
Català
Euskara
Русский
Čeština
Suomi
Svenska
polski
Dansk
slovenščina
اللغة العربية
বাংলা
Galego
Tiếng Việt
Hrvatski
हिंदी
Հայերէն
Українська
Language
Library Catalog
All Fields
Title
Author
Subject
Call Number
ISBN/ISSN
Find
Advanced Search
|
Browse
|
Search Tips
Atomlagenabscheidung von Hafni...
Cite this
Text this
Email this
Print
Export Record
Export to RefWorks
Export to EndNoteWeb
Export to EndNote
Save to List
Permanent link
Atomlagenabscheidung von Hafniumoxid.
Saved in:
Bibliographic Details
Main Author:
Zilbauer, Thomas
Format:
eBook
Language:
German
Published:
Göttingen :
Cuvillier Verlag,
2010.
Subjects:
Chemical vapor deposition.
Atomic layer deposition.
Hafnium oxide.
Atomic layer deposition
Chemical vapor deposition
Hafnium oxide
Online Access:
Click for online access
Holdings
Description
Table of Contents
Similar Items
Staff View
Table of Contents:
Pages:1 to 25; Pages:26 to 50; Pages:51 to 75; Pages:76 to 100; Pages:101 to 125; Pages:126 to 150; Pages:151 to 165.
Similar Items
Handbook of physical vapor deposition (PVD) processing
by: Mattox, D. M.
Published: (2010)
Atomic layer deposition : principles, characteristics, and nanotechnology applications
by: Kääriäinen, Tommi
Published: (2013)
CVD Polymers : fabrication of organic surfaces and devices
Published: (2015)
Glancing Angle Deposition of Thin Films : Engineering the Nanoscale.
by: Hawkeye, Matthew M.
Published: (2014)
Magneto Luminous Chemical Vapor Deposition.
by: Yasuda, Hirotsugu
Published: (2011)