Principles of Chemical Vapor Deposition

Principles of Chemical Vapor Deposition by D.M. Dobkin, M.K. Zuraw.

Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equip...

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Bibliographic Details
Main Authors: Dobkin, D.M (Author), Zuraw, M.K (Author)
Corporate Author: SpringerLink (Online service)
Format: eBook
Language:English
Published: Dordrecht : Springer Netherlands : Imprint: Springer, 2003.
Edition:1st ed. 2003.
Series:Springer eBook Collection.
Subjects:
Materials science.
Chemical engineering.
Manufactures.
Nuclear physics.
Heavy ions.
Electronic resources (E-books)
Online Access:Click to view e-book
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Call Number: E-Book
Status: Available

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