Plasma Processing of Semiconductors

Plasma Processing of Semiconductors edited by P.F. Williams.

Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage rang...

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Bibliographic Details
Corporate Author: SpringerLink (Online service)
Other Authors: Williams, P.F (Editor)
Format: eBook
Language:English
Published: Dordrecht : Springer Netherlands : Imprint: Springer, 1997.
Edition:1st ed. 1997.
Series:Nato Science Series E:, Applied Sciences, 336
Springer eBook Collection.
Subjects:
Electronics.
Microelectronics.
Electrical engineering.
Manufactures.
Optical materials.
Electronic materials.
Atoms.
Physics.
Electronic resources (E-books)
Online Access:Click to view e-book
Holy Cross Note:Loaded electronically.
Electronic access restricted to members of the Holy Cross Community.
Table of Contents:
  • Plasma Etching
  • to Plasma Etching
  • Plasma Chemistry, Basic Processes and PECVD
  • The Role of Ions in Reactive Ion Etching with Low Density Plasmas
  • SiO2 Etching in High-Density Plasmas: Differences with Low-Density Plasmas
  • Plasma Deposition
  • to Plasma Enhanced Chemical Vapor Deposition
  • Topography Evolution During Semiconductor Processing
  • Deposition of Amorphous Silicon
  • Plasma Sources
  • High Density Sources for Plasma Etching
  • Resonant Plasma Excitation by Electron Cyclotron Waves—Fundamentals and Applications
  • The Transition from Capacitive to Inductive to Wave Sustained Discharges
  • Physics of Surface-Wave Discharges
  • Plasma-Surface Interactions
  • Surface Science Aspects of Etching and Wall Reactions in High Density Plasmas
  • Plasma-Surface Interactions
  • Cl2 Plasma-Si Surface Interactions in Plasma Etching
  • Numerical Modeling
  • Particle in Cell Monte Carlo Collision Codes (PIC-MCC); Methods and Applications to Plasma Processing
  • Fluid and Hybrid Models of Non Equilibrium Discharges
  • Plasma Diagnostics
  • Optical Diagnostics of Processing Plasmas
  • Optical Diagnostics of Plasmas: A Tool for Process Control
  • Infrared Absorption Spectroscopy as a Diagnostic for Processing Plasmas
  • Ellipsometric Analysis of Plasma Deposited and Plasma Etched Materials
  • Mass Spectrometry of Reactive Plasmas
  • Less Conventional Processing Applications of Plasmas
  • Deposition of Silicon Dioxide Films using the Helicon Diffusion Reactor for Integrated Optics Applications
  • Remote Plasma Processing
  • Magnetized Surface-Wave Discharges for Submicrometer Pattern Transfer
  • Dusty Plasmas: Fundamental Aspects and Industrial Applications
  • Industrial Application of Plasmas for Processing
  • Low Energy Plasma Beams for Semiconductor Technology
  • Process Control Concepts
  • Issues and Solutions for Applying Process Control to Semiconductor Manufacturing.

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