Film Deposition by Plasma Techniques

Film Deposition by Plasma Techniques by Mitsuharu Konuma.

Properties of thin films depend strongly upon the deposition technique and conditions chosen. In order to achieve the desired film, optimum deposition conditions have to be found by carrying out experiments in a trial-and­ error fashion with varying parameters. The data obtained on one growth appara...

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Bibliographic Details
Main Author: Konuma, Mitsuharu (Author)
Corporate Author: SpringerLink (Online service)
Format: eBook
Language:English
Published: Berlin, Heidelberg : Springer Berlin Heidelberg : Imprint: Springer, 1992.
Edition:1st ed. 1992.
Series:Springer Series on Atomic, Optical, and Plasma Physics, 10
Springer eBook Collection.
Subjects:
Atoms.
Physics.
Condensed matter.
Engineering.
Electronic resources (E-books)
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Call Number: E-Book
Status: Available

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