Plasma Charging Damage

Plasma Charging Damage by Kin P. Cheung.

In the 50 years since the invention of transistor, silicon integrated circuit (IC) technology has made astonishing advances. A key factor that makes these advances possible is the ability to have precise control on material properties and physical dimensions. The introduction of plasma processing in...

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Bibliographic Details
Main Author: Cheung, Kin P. (Author)
Corporate Author: SpringerLink (Online service)
Format: eBook
Language:English
Published: London : Springer London : Imprint: Springer, 2001.
Edition:1st ed. 2001.
Series:Springer eBook Collection.
Subjects:
Chemical engineering.
Manufactures.
Optical materials.
Electronic materials.
Electronics.
Microelectronics.
Materials—Surfaces.
Thin films.
Electronic resources (E-books)
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