High Dielectric Constant Materials VLSI MOSFET Applications / edited by Howard Huff, David Gilmer.

Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their i...

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Bibliographic Details
Corporate Author: SpringerLink (Online service)
Other Authors: Huff, Howard (Editor), Gilmer, David (Editor)
Format: eBook
Language:English
Published: Berlin, Heidelberg : Springer Berlin Heidelberg : Imprint: Springer, 2005.
Edition:1st ed. 2005.
Series:Springer Series in Advanced Microelectronics, 16
Springer eBook Collection.
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Online Access:Click to view e-book
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