Atomic layer deposition : principles, characteristics, and nanotechnology applications / Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, and Arthur Sherman.
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It cov...
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Bibliographic Details
| Main Author: |
Kääriäinen, Tommi |
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| Other Authors: |
Cameron, David, 1949-,
Kääriäinen, Marja-Leena,
Sherman, Arthur, 1931- |
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| Format: | eBook
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| Language: | English |
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| Published: |
Hoboken, New Jersey :
John Wiley & Sons,
[2013]
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| Subjects: | |
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| Online Access: | Click for online access
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