Atomic layer deposition : principles, characteristics, and nanotechnology applications / Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, and Arthur Sherman.
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It cov...
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Bibliographic Details
Main Author: |
Kääriäinen, Tommi |
Other Authors: |
Cameron, David, 1949-,
Kääriäinen, Marja-Leena,
Sherman, Arthur, 1931- |
Format: | eBook
|
Language: | English |
Published: |
Hoboken, New Jersey :
John Wiley & Sons,
[2013]
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Subjects: | |
Online Access: | Click for online access
|