Directed self-assembly of block copolymers for nano-manufacturing / edited by Roel Gronheid and Paul Nealey.
The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufactur...
Full description
Saved in: